La Tecnovalvo Srl - Via Raffaello Sanzio 60, 20021 Bollate (MI) - tel. 02.3503508 - info@latecnovalvo.com - p.iva 00235270154

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Reserch & Development

Simulation is a key element in designing a valve for critical applications that require complex designs. Crystal formation or sediment deposition, for example, can be avoided or mitigated in the design phase through the use of CDF simulations (Ansys).

Our R&D team proceeds daily in simulations to find new solutions suitable to meet the required requirements such as:

• fluid speed control and analysis
• dissipation of kinetic energy
• erosion resistance
• discharge capacity under the required conditions

La Tecnovalvo Srl - Via Raffaello Sanzio 60, 20021 Bollate (MI) - Ph. 02.3503508 - email : info@latecnovalvo.com - VAT Nr. 00235270154